发明名称 METHOD FOR PRODUCING FINE SILICA POWDER
摘要 PROBLEM TO BE SOLVED: To easily produce fine silica powder suitable for use as a filler for a semiconductor sealant and having a sharp particle size distribution which is mainly in a submicron range. SOLUTION: In the method for producing the fine silica powder, an aqueous slurry containing metallic silicon powder is sprayed in a hot field at >=10 m/see jetting rate and the resulting silica powder is collected. Preferably the slurry is prepared using a medium agitation type wet grinder, the hot field is a chemical flame and the slurry is an aqueous slurry having 20-70% concentration of metallic silicon powder.
申请公布号 JP2002020113(A) 申请公布日期 2002.01.23
申请号 JP20000352328 申请日期 2000.11.20
申请人 DENKI KAGAKU KOGYO KK 发明人 YOSHIDA AKIO;ICHIKAWA KOKI;NAGASAKA HIDEAKI;WATANABE SHOJIRO
分类号 C01B33/18;C08K3/36;(IPC1-7):C01B33/18 主分类号 C01B33/18
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