POSITIVE TYPE PHOTOSENSITIVE COMPOSITION

摘要

PURPOSE: To solve the problems of a performance enhancing technique proper to microphotofabrication using far ultraviolet light, particularly ArF excimer laser light and to provide a positive type photosensitive composition excellent also in sensitivity, resolving power and margin for exposure. CONSTITUTION: The positive type photosensitive composition contains a compound which generates an acid when irradiated with active light or radiation and a resin having a specified alicyclic hydrocarbon structure and having solubility in an alkali developing solution increased when the resin is decomposed by the action of the acid.