| 发明名称 |
Coating solution and method for forming dielectric film |
| 摘要 |
A coating solution of a poly(phenylsilsesquioxane) ladder polymer having a weight average molecular weight of 4,000-100,000 in a suitable solvent is spin coated and heated to form a dense dielectric film having a low dielectric constant.
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| 申请公布号 |
US6340735(B1) |
申请公布日期 |
2002.01.22 |
| 申请号 |
US20000541084 |
申请日期 |
2000.03.31 |
| 申请人 |
SHIN-ETSU CHEMICAL CO., LTD. |
发明人 |
YAGIHASHI FUJIO |
| 分类号 |
C08L83/04;C08G77/06;C08G77/14;C09D183/04;(IPC1-7):C08G77/06 |
主分类号 |
C08L83/04 |
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