| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a soluble multifunctional vinyl aromatic copolymer having development characteristic exceeding a conventional resist material, having process adaptability, having a sufficient pattern shape after exposure and further indicating an excellent heat-resistant pattern shape-retaining property, a resist composition, and especially a chemically amplified positive type resist composition. <P>SOLUTION: The copolymer includes a structural unit (a) derived from a divinyl aromatic compound and a structural unit (b) derived from a mono-vinyl aromatic compound. The multifunctional vinyl aromatic copolymer has a terminal end group derived from one or more catechol-based compound per molecule in average represented by formula (1) on the terminal end, has a number average molecular weight of 500-10,000, and is soluble in an organic solvent such as ketones, aromatic hydrocarbons and alcohols. The chemically amplified positive type resist composition contains the multifunctional vinyl aromatic copolymer and an acid generating agent. In formula (1), R<SB>2</SB>is hydrogen or an acid-unstabilized group and the amount of the group is 5-15 mol.%. <P>COPYRIGHT: (C)2011,JPO&INPIT |
