| 摘要 |
<p>An uneven light intensity distribution inspecting method comprises imaging an image print mask (12H) of when an image print mask (12H) for shaping and projecting a light beam from a light source (13) is irradiated with the light from the side opposed to the light source (13), picking up the luminance signal representing the luminance of the image print mask (12H) on the basis of the produced image of the image print mask (12H), creating a luminance level waveform pattern (113A or 113B) according to the luminance signal, and displaying the luminance level waveform pattern (113A or 113B) as an uneven light intensity distribution of the light projected onto the image print mask (12H). The uneven light intensity distribution of the light projected onto the image print mask (12H) can be visually recognized on the spot by the user through the luminance level waveform pattern (113A or 113B).</p> |
