| 摘要 |
PURPOSE: Provided is a lithographic projection apparatus which specifically includes corrective optics to reduce ellipticity error. CONSTITUTION: The lithographic projection apparatus comprises: a radiation system to provide a projection beam of radiation, the radiation system comprising an illumination system, the illumination system being adjustable with respect to angular and spatial energy distributions of the projection beam and to provide a preselected intensity distribution of the projection beam in a pupil of the illumination system; a support structure to support patterning structure, the patterning structure serving to pattern the projection beam according to a desired pattern; a substrate table to hold a substrate and being movable along X and Y directions in an X, Y-coordinate system defined in the apparatus; a projection system to project the patterned beam onto a target portion of the substrate, and to project the intensity distribution onto a pupil of the projection system; an optical element rotatable around the optical axis of the projection apparatus to correct an intensity anomaly comprising two elongated sections distributed along the X and Y direction, respectively, and having different intensities.
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