| 摘要 |
PURPOSE: To provide a new method for manufacturing a TFT which can remarkably reduce the number of manufacturing steps for a liquid crystal display device by using a pattern formation method enabling convenient reduction of the number of photolithographical steps. CONSTITUTION: A material film forming a TFT is laminated on an insulating film substrate, a resist mask having a plurality of areas of different thicknesses is provided on an uppermost layer and then patterned. And a conductor film is formed in the form of a pattern by a lift-off process using the resist mask. Or a resist mask separately formed and having a plurality of areas having different thicknesses is used to sequentially process ones of the laminated material films. Using such a new pattern formation method and processing method, a liquid crystal display device so far manufactured in five photolithographical steps in the prior art can be manufactured in two or three photolithographical steps. |
