发明名称 GROUND SUBSTRATE, SUBSTRATE GRINDING DEVICE AND GRINDING METHOD
摘要 PROBLEM TO BE SOLVED: To provide a ground substrate which has a bank 1-3μm high along its periphery. SOLUTION: A grindstone 5 in disc form whose center is fixed on an axis 6 of rotation placed above a chuck 2 in parallel with its surface is lowered toward the surface of a substrate (w) in nearly disc shape which is placed on the horizontally rotatable chuck 2 until the peripheral wall of the grindstone 5 in disc form comes into contact with the substrate surface and the substrate surface is ground by pressing the turning grindstone 5 in disc form against the substrate (w) which is horizontally rotated by the rotation of the chuck 2, while a grind lubricant is supplied to the substrate surface and one of the chuck 2 and the grindstone 5 in disc form is shifted from side to side. In the final process of grinding, the turning grindstone 5 in disc form is vertically raised step by step when the relative position of grindstone 5 to the substrate w has reached from the center of the substrate w up to near its circumference. In this way, substrate w each provided with a rounded bank along its periphery are manufactured.
申请公布号 JP2002009022(A) 申请公布日期 2002.01.11
申请号 JP20000188614 申请日期 2000.06.23
申请人 OKAMOTO MACHINE TOOL WORKS LTD 发明人 KIDA HIROAKI;SEKIDA SABURO;KUBO TOMIO;TOKUGAWA YOSHITADA
分类号 B24B7/22;H01L21/304;(IPC1-7):H01L21/304 主分类号 B24B7/22
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