METHOD FOR FORMING METAL LINE

摘要

PURPOSE: A method for forming a metal line is provided to improve an electric characteristic of a metal line by forming the metal line as a deposition process. CONSTITUTION: An insulating substrate(31) having a plug layer(34) is prepared. The second oxide layer(35) and a photoresist layer are formed on the insulating substrate(31). The photoresist layer is exposed and developed selectively. The second oxide layer(35) is etched by using the photoresist layer as an etch mask. A contact hole is formed by etching the second oxide layer(35). The photoresist layer is removed. A polymer layer(38) as a dummy layer is formed on the second oxide layer(35) including the contact hole. A sidewall of the polymer layer(38) is formed on a side of the second oxide layer(35) by etching back the polymer layer(38). A metal layer is formed on the whole surface of the above structure. A metal line(39) is formed within the contact hole by etching back the metal layer.