| 摘要 |
PROBLEM TO BE SOLVED: To realize a wafer visual inspection apparatus, at a low cost, having a small lighting optical device that causes changes in the wavelength of illumination light, along with the adjustment of the quantity of the illumination light. SOLUTION: In the wafer visual inspection apparatus provided with a lighting optical system 15 for lighting the surface of a wafer 100 and a projection optical system 11 for forming an optical image of the surface of the wafer, the lighting optical system 11 is provided with quantity of illumination light adjusting mechanisms 40A-40C for selecting density filters to be arranged in the optical path of the illumination optical system from the groups 22 and 42 of a plurality of density filters, and at least a part of the plurality of density filters has a wavelength selection filter 43 which is selected simultaneously by selecting the density filters.
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