发明名称 Semiconductor processing method for processing discrete pieces of substrate to form electronic devices
摘要 A semiconductor processing system for the production of semiconductor electronic devices is described, which includes a sequence of semiconductor processing steps carried out on a plurality of semiconductor processing machines, whereby the processing is carried out on discrete pieces of substrate which are smaller than conventional semiconductor wafers but may be made therefrom, or from larger diameter semiconducting wafers or from materials onto which semiconductor layers may be formed, and the discrete substrate pieces are selectably processable into the electronic devices either individually or as a plurality removably fixed to a support.
申请公布号 US2001055857(A1) 申请公布日期 2001.12.27
申请号 US20010933495 申请日期 2001.08.20
申请人 IMEC VZW 发明人 MEURIS MARC;HEYNS MARC;MERTENS PAUL
分类号 H01L21/02;H01L21/00;H01L21/68;H01L29/06;(IPC1-7):H01L21/301 主分类号 H01L21/02
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