发明名称 Semiconductor device and method of fabricating
摘要 A capacitor in a semiconductor device is constituted by a lower electrode having a laminated layer including an adhesive layer formed on an insulating film, a barrier layer formed so as to cover the upper surface of the insulating layer, a nitride side formed so as to cover the side face of the adhesive layer, and an electrode layer formed so as to cover the upper surface of the barrier layer, a capacitor insulating film formed so as to cover the upper surface and side surface of the lower electrode, and an upper electrode formed so as to cover the surface of the capacitor insulating film.
申请公布号 US6333534(B1) 申请公布日期 2001.12.25
申请号 US20000678743 申请日期 2000.10.04
申请人 OKI ELECTRIC INDUSTRY CO., LTD. 发明人 CHEN SHIH-CHANG
分类号 H01L21/02;H01L21/285;H01L21/8242;(IPC1-7):H01L27/108 主分类号 H01L21/02
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