LITHOGRAPHIC APPARATUS, DEVICE MANUFACTURING METHOD, AND DEVICE MANUFACTURED BY THE METHOD

摘要

PROBLEM TO BE SOLVED: To provide a control system capable of carrying out improved on- the-fly leveling for a substrate or a mask during exposing process in a lithographic projection system. SOLUTION: In the lithographic apparatus, a combined output of a level sensor and an independent position sensor (LVDT or IFM) is subjected to filtering. By using its extracted set value, on-the-fly leveling is carried out in the lithographic apparatus. The level sensor may include a look-up head. In addition, the filter may be a low pass filter for blocking a level variation in wavelength shorter than the slit width during a scanning exposure. The filter may be so selected that cross-talk between tilt movements and horizontal displacement can be reduced.