发明名称 MULTIPHOTON ABSORPTION METHOD USING PATTERNED LIGHT
摘要 Methods for producing a region of at least partially reacted material in a photoreactive composition and apparatus. The methods include: providing a photoreactive composition; providing a source of sufficient light for simultaneous absorption of at least two photons by the photoreactive composition; providing an exposure system capable of inducing image-wise multiphoton absorption; generating a non-random three-dimensional pattern of light by means of the exposure system; and exposing the photoreactive composition to the three-dimensional pattern of light generated by the exposure system to at least partially react a portion of the material in correspondence with the non-random three-dimensional pattern of light incident thereon.
申请公布号 WO0196962(A2) 申请公布日期 2001.12.20
申请号 WO2001US19126 申请日期 2001.06.14
申请人 3M INNOVATIVE PROPERTIES COMPANY;FLEMING, PATRICK, R.;DEVOE, ROBERT, J.;STACEY, NICHOLAS, A.;LEATHERDALE, CATHERINE, A.;DEMASTER, ROBERT, D.;BALLEN, TODD, A. 发明人 FLEMING, PATRICK, R.;DEVOE, ROBERT, J.;STACEY, NICHOLAS, A.;LEATHERDALE, CATHERINE, A.;DEMASTER, ROBERT, D.;BALLEN, TODD, A.
分类号 G02B21/06;B81C99/00;G03F7/20;G03H1/02 主分类号 G02B21/06
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