发明名称 Substrate rotating apparatus
摘要 An apparatus for rotating a semiconductor substrate is provided which comprises a substrate holder for carrying the substrate thereon, a rotor for directly or indirectly supporting the substrate holder, a magnetic floating mechanism for magnetically floating and supporting the rotor in a non-contact state, and magnetic rotating mechanism for magnetically rotating the rotor. The magnetic floating mechanism and magnetic rotating mechanism are formed as a single integral unit structure. The unit structure includes a first set of windings for generating a magnetic field to provide the rotor with a rotating force, and a second set of windings for generating a magnetic field to float and support the rotor at a predetermined position. The first and second sets of windings are disposed on a single yoke plate made of a magnetic material.
申请公布号 US2001051499(A1) 申请公布日期 2001.12.13
申请号 US20010875134 申请日期 2001.06.07
申请人 EBARA CORPORATION 发明人 SHINOZAKI HIROYUKI
分类号 C23C14/50;C23C16/48;C23C16/52;H01L21/203;H01L21/205;H01L21/22;H01L21/26;H01L21/302;H01L21/3065;H01L21/683;H01L21/687;H02K7/09;H02K21/14;(IPC1-7):B24B29/00 主分类号 C23C14/50
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