发明名称 |
METHOD AND APPARATUS FOR ARC DEPOSITION |
摘要 |
A method and apparatus for depositing a coating on a substrate. A method of coating a substrate comprises evaporating a first reactant; introducing the evaporated reactant into a plasma; and depositing the first reactant on a surface of the substrate. This method may be used to deposit an electrically conductive, ultraviolet filter coating at high rate on a glass or polycarbonate substrate, for example. An apparatus for depositing a UV filter coating on a polymeric substrate comprises a plasma generator having an anode and a cathode to form a plasma, and a first inlet for introducing a first reactant into the plasma, the first reactant comprising an evaporated material that is deposited on the substrate by the plasma. Optionally, a nozzle can be utilized to provide a controlled delivery of the first reactant into the plasma. |
申请公布号 |
EP1161574(A1) |
申请公布日期 |
2001.12.12 |
申请号 |
EP20000907176 |
申请日期 |
2000.02.04 |
申请人 |
GENERAL ELECTRIC COMPANY |
发明人 |
IACOVANGELO, CHARLES, DOMINIC;BORST, KEITH, MILTON;JERABEK, ELIHU, CALVIN;MARZANO, PATRICK, PETER;YANG, BARRY, LEE-MEAN |
分类号 |
B60J1/00;C23C14/08;C23C14/32;C23C16/513;H01J37/32;(IPC1-7):C23C16/50;C23C14/24;C23C14/22;B05B7/22 |
主分类号 |
B60J1/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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