发明名称 METHOD AND APPARATUS FOR ARC DEPOSITION
摘要 A method and apparatus for depositing a coating on a substrate. A method of coating a substrate comprises evaporating a first reactant; introducing the evaporated reactant into a plasma; and depositing the first reactant on a surface of the substrate. This method may be used to deposit an electrically conductive, ultraviolet filter coating at high rate on a glass or polycarbonate substrate, for example. An apparatus for depositing a UV filter coating on a polymeric substrate comprises a plasma generator having an anode and a cathode to form a plasma, and a first inlet for introducing a first reactant into the plasma, the first reactant comprising an evaporated material that is deposited on the substrate by the plasma. Optionally, a nozzle can be utilized to provide a controlled delivery of the first reactant into the plasma.
申请公布号 EP1161574(A1) 申请公布日期 2001.12.12
申请号 EP20000907176 申请日期 2000.02.04
申请人 GENERAL ELECTRIC COMPANY 发明人 IACOVANGELO, CHARLES, DOMINIC;BORST, KEITH, MILTON;JERABEK, ELIHU, CALVIN;MARZANO, PATRICK, PETER;YANG, BARRY, LEE-MEAN
分类号 B60J1/00;C23C14/08;C23C14/32;C23C16/513;H01J37/32;(IPC1-7):C23C16/50;C23C14/24;C23C14/22;B05B7/22 主分类号 B60J1/00
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