| 摘要 |
PROBLEM TO BE SOLVED: To provide a photosensitive polymer composition capable of giving a pattern of a good shape with intrasurface uniformity in patterning on metallic foil and ensuring no peeling between the metallic foil and the pattern. SOLUTION: The photosensitive polymer composition is applied onto a metallic foil, prebaked, exposed and developed to form a pattern and has <=25×10-6 (1/ deg.C) average coefficient of thermal linear expansion in the range of 30-100 deg.C after curing. The composition contains (A) a polymer, (B) an assistant compound which assists adhesion to the metal and (C) a photosensitive agent as essential components. |
