ABRASIVE COMPOSITION AND POLISHING METHOD USING THE SAME

摘要

PROBLEM TO BE SOLVED: To provide an abrasive composition which makes colloidal silica highly stable in polishing the surfaces, particularly, metallic surfaces of various kinds of semiconductor devices, magnetic disks, etc., and can maintain a stable polishing characteristic for a long time and with which a high-accuracy high- quality specular surface can be obtained. SOLUTION: This abrasive composition contains water, cationic colloidal silica, and a metal nitrate.