| 摘要 |
PROBLEM TO BE SOLVED: To provide a spray chamber capable of executing highly sensitive and stable analysis by heightening introduction efficiency of sample solution into plasma, and by suppressing the arriving rate of a solvent component in a plasma torch, in an ICP analytical device. SOLUTION: This ICP analytical device is equipped with a nebulizer for nebulizing the sample solution for the purpose of analyzing trace impurities in the sample solution, the plasma torch for introducing nebulized fog into plasma, and the spray chamber placed between the nebulizer and the plasma torch for classifying the particle size of the fog. The device is characterized by forming the spray chamber so as to have a cylindrical structure, a heater provided on the center part, and a cooled circumferential part, and passing the fog between the heater and the circumferential part. |
