TUNING ELECTRODES USED IN A REACTOR FOR ELECTROCHEMICALLY PROCESSING A MICROELECTRONIC WORKPIECE
摘要
A facility for selecting and refining electrical parameters for processing a microelectronic workpiece in a processing chamber is described. The facility initially configures the electrical parameters in accordance with either a numerical of the processing chamber or experimental data derived from operating the actual processing chamber. After a workpiece is processed with the initial parameter configuration, the results are measured and a sensitivity matrix based upon the numerical model of the processing chamber is used to select new parameters that correct for any deficiencies measured in the processing of the first workpiece. These parameters are then used in processing a second workpiece, which may be similarly measured, and the results used to further refine the parameters.
申请公布号
WO0190434(A2)
申请公布日期
2001.11.29
申请号
WO2001US14509
申请日期
2001.05.04
申请人
SEMITOOL, INC.;WILSON, GREGORY, J.;MCHUGH, PAUL, R.;WEAVER, ROBERT, A.;RITZDORF, THOMAS, L.
发明人
WILSON, GREGORY, J.;MCHUGH, PAUL, R.;WEAVER, ROBERT, A.;RITZDORF, THOMAS, L.