| 摘要 |
PROBLEM TO BE SOLVED: To provide a system for forming a deposited film by which abnormal discharge is not generated even when high frequency power of large electric power is applied and an a-C:H deposited film of high quality having high hard ness can stably and uniformly be deposited on a substrate with a large area and to provide a method for forming the film. SOLUTION: In the producing system in which a substrate 102 is set inside a reaction vessel provided with an exhausting means and a gaseous starting material feeding means and being airtight under vacuum, a gaseous starting material at least composed of hydrocarbon is decomposed by high frequency electric power, and a deposition film composed of non-single crystal carbon containing hydrogen atoms is deposited on the above substrate, a protective board 112, a protective ring 113 or the like are set so that electrically conductive projecting parts in which the ratio of the height H to the shortest width W of the cross-section when viewed vertically downwards from the height direction, i.e., (H/W) is >1.0, and also, the height is <100 mm are not exposed to a discharge space.
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