发明名称 High mobility heterojunction transistor and method
摘要 A heterojunction transistor with high mobility carriers in the channel region includes a source region and a drain region formed in a semiconductor body with the source region and the drain region comprising doped semiconductor alloys separated from the substrate by heterojunctions. A channel region is provided between the source region and the drain region comprising an undoped layer of an alloy of the semiconductor material and a deposited layer of material of the semiconductor body overlying the undoped layer. A gate electrode is formed on a gate oxide over the channel region. In fabricating the high mobility heterojunction transistor, the spaced source and drain regions are formed in the substrate by implanting dopant of conductivity type opposite to the substrate and a material in the alloy and then annealing the structure to form the alloy of the semiconductor material under the undoped layer.
申请公布号 US6319799(B1) 申请公布日期 2001.11.20
申请号 US20000568091 申请日期 2000.05.09
申请人 BOARD OF REGENTS, THE UNIVERSITY OF TEXAS SYSTEM 发明人 OUYANG QIQING;TASCH, JR. AL F.;BANERJEE SANJAY KUMAR
分类号 H01L29/778;(IPC1-7):H01L21/425 主分类号 H01L29/778
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