发明名称 FLUORINE-CONTAINING SYNTHETIC QUARTZ GLASS AND ITS MANUFACTURING METHOD
摘要 <p>PROBLEM TO BE SOLVED: To obtain fluorine-containing synthetic quartz glass having high transmissivity of vacuum ultraviolet ray and homogeneous fluorine atom concentration by manufacturing fluorine-containing porous silica parent material in an atmosphere containing a gaseous fluorine compound and then subjecting the material to vetrification. SOLUTION: Gaseous oxygen, gaseous hydrogen and gaseous raw material for manufacturing silica are supplied from a burner to a reaction region, silica fine particles are formed in this reaction region by flame hydrolysis of the gaseous raw material for manufacturing silica and further the silica fine particles are deposited on a base material rotatably arranged in the reaction region to manufacture porous silica parent material and then the parent material is molten to obtain quartz glass. In this manufacturing method of synthetic quartz glass, gaseous fluorine compound is supplied into a parent material manufacturing device from a position other than a burner at the time of manufacturing the parent material to manufacture the fluorine-containing porous silica parent material in the atmosphere containing the gaseous fluorine compound.</p>
申请公布号 JP2001322820(A) 申请公布日期 2001.11.20
申请号 JP20000383142 申请日期 2000.12.18
申请人 SHIN ETSU CHEM CO LTD 发明人 MATSUO KOJI;YAMADA MOTOYUKI;OTSUKA HISATOSHI;SHIROTA KAZUO;MAIDA SHIGERU
分类号 G02B6/00;C03B8/04;C03B19/14;C03B20/00;C03C3/06;G02B1/00;G03F1/60;G03F7/20;(IPC1-7):C03B8/04;G03F1/14 主分类号 G02B6/00
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