发明名称 AIR KNIFE AND METHOD OF TREATING THE SAME, AND METHOD AND APPARATUS FOR MANUFACTURING SEMICONDUCTOR DEVICE
摘要 PROBLEM TO BE SOLVED: To make stable production possible by preventing static electricity on air knives to prevent the electrostatic destruction of a semiconductor device and a shift of the threshold voltage Vth of a TFT. SOLUTION: An apparatus for manufacturing a semiconductor device on a substrate comprises air knives 104, 105, 106 for spraying a gas against the substrate 100, and means 107, 109 for casting soft X-rays on the gas sprayed by the air knives. In a method for manufacturing a semiconductor device on the substrate, the gas to be sprayed by the air knives 104, 105, 106 against the substrate 100 is applied against the substrate 100 while soft X-rays are directly cast on the gas.
申请公布号 JP2001319916(A) 申请公布日期 2001.11.16
申请号 JP20000137213 申请日期 2000.05.10
申请人 CANON INC 发明人 MOCHIZUKI CHIORI
分类号 G02F1/1333;H01L21/304;H01L21/306;(IPC1-7):H01L21/304 主分类号 G02F1/1333
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