| 摘要 |
A device for electron-beam lithography wherein very small pits can be written, using a small beam intensity, by exposing each pit several times during writing. A row of electron beams is arranged in the longitudinal direction of the track. Each beam from the row of beams can be controlled, either to be projected onto the track via electron optics, or to be scattered to an electron absorbing position. The control of the row of beams ensures that each time a track position to be exposed passes the projection position of a beam from said row of beams, the beam in question is projected onto the position in question. Furthermore means are provided for shifting the beams from the row of beams in transverse direction on the track for the purpose of writing a second track simultaneously with the main track. Finally, several rows of beams arranged one beside another for simultaneously writing onto two tracks arranged one beside another are described. |
