发明名称 Position detecting system and projection exposure apparatus with the same
摘要 A position detecting system to be used with a grating mark provided on an object and having different directionalities is disclosed, wherein light is projected to the grating mark, and wherein light from the grating mark is detected through a beam splitter disposed at or adjacent a pupil of a detection optical system, for receiving light from the grating mark, the beam splitter having a reflective coating partially formed thereon.
申请公布号 US6313916(B1) 申请公布日期 2001.11.06
申请号 US19980179594 申请日期 1998.10.27
申请人 CANON KABUSHIKI KAISHA 发明人 INADA HIROSHI
分类号 G03F9/00;H01L21/027;(IPC1-7):G01B11/00 主分类号 G03F9/00
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