LARGE AREA PLASMA SOURCE,申请号EP19990961807-传众专利搜索

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发明名称	LARGE AREA PLASMA SOURCE
摘要
申请公布号	EP1147242(A1)	申请公布日期	2001.10.24
申请号	EP19990961807	申请日期	1999.12.10
申请人	TOKYO ELECTRON LIMITED	发明人	JOHNSON, WAYNE, L.
分类号	H05H1/46;B01J19/08;C23C16/00;C23C16/507;H01J37/32;H01L21/205;H01L21/26;H01L21/302;H01L21/306;H01L21/3065;H01L21/42;H05H1/00;(IPC1-7):C23C16/00	主分类号	H05H1/46
代理机构		代理人
主权项
地址

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