发明名称 Process for fabrication of split-gate virtual phase charge coupled devices
摘要 The method for making a virtual phase charge coupled device with multi-directional charge transfer capabilities includes: forming a semiconductor region 48 of a first conductivity type; forming first gate regions 32 and 36 overlying and separated from the semiconductor region 48; forming second gate regions 34 and 38 adjacent to the first gate regions 32 and 36 and electrically separated from the first gate regions 32 and 36; forming virtual gate regions 24, 26, and 28 of a second conductivity type in the semiconductor region 48 and aligned to the gate regions 32, 34, 36, and 38.
申请公布号 US2001031517(A1) 申请公布日期 2001.10.18
申请号 US20000728261 申请日期 2000.12.01
申请人 HYNECEK JAROSLAV 发明人 HYNECEK JAROSLAV
分类号 H01L27/148;(IPC1-7):H01L21/339 主分类号 H01L27/148
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