Device for coating substrates with a material vapor in negative pressure or vacuum

摘要

An apparatus for coating a substrate with a material vapor in negative pressure includes a material vapor source for releasing a material vapor and an ionization device having a cold cathode and a cold anode for producing an arc discharge between anode and cathode for ionizing the material vapor to form a plasma. A first power supply is provided for the ionization device and a second power supply is provided for the material vapor source.