EXPOSURE SYSTEM, METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, AND MAINTENANCE METHOD FOR SEMICONDUCTOR MANUFACTURING PLANT AND EXPOSURE SYSTEM

摘要

PROBLEM TO BE SOLVED: To provide a high-throughput aligner. SOLUTION: This exposure system which uses an excimer laser as a light source is provided with a chamber which contains an optical system and can make prescribed gas replacement, and a gas circulating mechanism having an exhaust port for exhausting the gas in the chamber and a supply port for supplying the gas into the chamber. On the circulating route of the circulating mechanism, a plurality of cleaners is arranged in parallel with each other in a state where the cleaners can be switched to each other.