| 摘要 |
<p>PROBLEM TO BE SOLVED: To provide a deposited film treating system and method for suppressing unstable factors for discharging, such as the ununiform plasma discharge, local abnormal discharge and sparks easily generated near the openings of the inlet parts and the outlet parts of a carrying belt provided in an each reaction chamber, in the case deposited film treatment is continuously performed on a carrying belt in a roll to roll system or the like. SOLUTION: A high frequency electric power supplying electrode exposed in plasma discharge is composed of plural members different in relative magnetic permeability in such a way the member having higher relative permeability is placed in the direction further from the high frequency electric power supplying part. Discharge unstable factors such as the ununiform plasma discharge, local abnormal discharge and sparks near the openings of the inlet and outlet parts of carrying belts are suppressed. The member furthest from the high frequency electric power supplying part is desirably composed of a magnetic material having relative permeability of >=100, and L1<=15 mm and also L1<L2 are desirably satisfied where the distance between CSs at the end of the electrode is L1 and the distance between CSs at the central of the electrode is L2 and also the distance in the direction from the electric power supplying part at the end of the electrode satisfies desirably W1>=5 mm.</p> |
