发明名称 METHOD AND APPARATUS FOR TREATING SUBSTRATE
摘要 PROBLEM TO BE SOLVED: To provide a method for treating the surface of a substrate by supplying chemical to a treating tank, stopping supply of chemical to the treating tank after it is filled with chemical and then immersing the substrate into the chemical for a prescribed time in which treating time can be corrected accurately, even if there is a difference between the temperature of chemical supplied into the treating tank and the ambient temperature of the treating tank and the immersion time is long. SOLUTION: Temperature of chemical supplied into the treating tank 10 is measured, and the temperature of chemical in the treating tank is calculated at an intermediate point of a preset immersion time, based on the temperature of chemical and the ambient temperature of the treating tank. It is then used as an effective temperature for correcting the immersion time.
申请公布号 JP2001274137(A) 申请公布日期 2001.10.05
申请号 JP20000088908 申请日期 2000.03.28
申请人 DAINIPPON SCREEN MFG CO LTD 发明人 YAMAMURA MASAAKI;NAKAJIMA KAZUO;INUBUSHI HIROSHI
分类号 C23F1/08;H01L21/306;(IPC1-7):H01L21/306 主分类号 C23F1/08
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