发明名称 |
METHOD AND APPARATUS FOR TREATING SUBSTRATE |
摘要 |
PROBLEM TO BE SOLVED: To provide a method for treating the surface of a substrate by supplying chemical to a treating tank, stopping supply of chemical to the treating tank after it is filled with chemical and then immersing the substrate into the chemical for a prescribed time in which treating time can be corrected accurately, even if there is a difference between the temperature of chemical supplied into the treating tank and the ambient temperature of the treating tank and the immersion time is long. SOLUTION: Temperature of chemical supplied into the treating tank 10 is measured, and the temperature of chemical in the treating tank is calculated at an intermediate point of a preset immersion time, based on the temperature of chemical and the ambient temperature of the treating tank. It is then used as an effective temperature for correcting the immersion time.
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申请公布号 |
JP2001274137(A) |
申请公布日期 |
2001.10.05 |
申请号 |
JP20000088908 |
申请日期 |
2000.03.28 |
申请人 |
DAINIPPON SCREEN MFG CO LTD |
发明人 |
YAMAMURA MASAAKI;NAKAJIMA KAZUO;INUBUSHI HIROSHI |
分类号 |
C23F1/08;H01L21/306;(IPC1-7):H01L21/306 |
主分类号 |
C23F1/08 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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