| 摘要 |
PROBLEM TO BE SOLVED: To provide a photosensitive resin composition having high sensitivity to exposure, a photosensitive resin composition capable of forming a pattern uniform in thickness and a color filter for a display with desired patterns such as colored layers, a black matrix, a protective layer and a gap holding material with a high degree of accuracy. SOLUTION: Each of the photosensitive resin compositions contains at least a photopolymerization initiator, a monomer having an unsaturated double bond, an epoxy resin and an alicyclic compound-containing resin obtained by polymerizing a monomer containing at least a vinyl group and/or an isopropenyl group. |
