发明名称 PROCESS TANK FOR PHOTOSENSITIVE MATERIAL PROCESSING DEVICE
摘要 PROBLEM TO BE SOLVED: To provide a plane smoothing process which is easy when a process tank is formed by expansion molding. SOLUTION: When the process tank 22 used for a PS plate processor is method by expansion molding, an aqueous silicone coating material or liquid rubber coating material is applied on the surface of the process tank. As a result, the surface is smoothed by filling the wrinkle-like fine grooves generated on the surface of the process tank when formed by the expansion molding. The rising of the processing liquid by the capillarity caused by the fine grooves may be thereby surely prevented without the execution of vapor processing using a solvent. Since the vapor processing is not executed, the working hygiene and safety may be improved and the cost may be lowered.
申请公布号 JP2001272798(A) 申请公布日期 2001.10.05
申请号 JP20000083566 申请日期 2000.03.24
申请人 FUJI PHOTO FILM CO LTD 发明人 NOZAWA YOSHIE;SUTANI TOSHIHIRO;INOUE KENJI
分类号 G03F7/30;(IPC1-7):G03F7/30 主分类号 G03F7/30
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