发明名称 Secondary electron filtering method, defect detection method and device manufacturing method using the same method
摘要 If a conventional mesh filter is used for a voltage contrast measurement on a specimen surface, aberrations that is difficult to correct in a primary electron (PE) beam are generated and then it is difficult to obtain a fine focused beam. An axially symmetric electrode is placed between the secondary electron (SE) detector and the specimen. Through an adjustment for an applied voltage in the electrode, a potential on the optical axis above the specimen is adjusted so that a passage or non-passage of the SEs can be controlled.
申请公布号 US2001025929(A1) 申请公布日期 2001.10.04
申请号 US20010818226 申请日期 2001.03.28
申请人 NAKASUJI MAMORU 发明人 NAKASUJI MAMORU
分类号 G01N23/225;H01J37/05;H01J37/147;H01J37/22;H01J37/244;H01J37/28;H01L21/66;(IPC1-7):G01K1/08;H01J3/14;H01J3/26 主分类号 G01N23/225
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