POSITIVE ELECTRON BEAM OR X-RAY RESIST COMPOSITION

摘要

PURPOSE: Provided are not only a positive electron beam or X-ray resist composition having high resolution but also a high-intensity and high-resolution positive electron beam or X-ray resist composition by adding a compound to generate acid and/or specified low molecular compound with dissolution-inhibiting property. CONSTITUTION: The composition comprises a compound(A) generating acid by irradiating the electron beam or X-ray; and another compound(B) having radicals to be decomposed by the acid, and containing lower molecular dissolution-inhibiting compound able to increase its solubility to alkali development solution by the acid and to have more than 1000 and not more than 3000 of molecular weight. The composition has a specified structure non-conjugated to at least two triphenylmethane structures other than the decomposable radicals by the acid in the low molecular dissolution-inhibiting compound.