发明名称 PLASMA, CVD SYSTEM, AND METHOD FOR DETECTING ITS MALFUNCTION
摘要 PROBLEM TO BE SOLVED: To detect the malfunction of a susceptor before it occurs, to prevent the occurrence of defective articles, and to improve yield. SOLUTION: A plasma CVD system 1, where plasma is generated between a couple of parallel plate RF electrodes disposed in a chamber 2 to deposit a film on the surface of a wafer placed on one of the RF electrode, is provided. This plasma CVD system 1 is provided with the following: an RF generator 3 for supplying high frequency voltage to the RF electrodes; an RF matching box 4 disposed between the RF generator 3 and the RF electrodes; a DC bias detecting means for detecting DC bias signals from the RF matching box 4; and a judging means 5a for judging the presence of arcing in the chamber 2 on the basis of the detected DC bias signals.
申请公布号 JP2001262355(A) 申请公布日期 2001.09.26
申请号 JP20000073391 申请日期 2000.03.16
申请人 APPLIED MATERIALS INC 发明人 NOHIRA MASAYOSHI;IWATA HIDEYUKI;ICHIKI KOZO
分类号 C23C16/52;(IPC1-7):C23C16/52 主分类号 C23C16/52
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