发明名称 |
PLASMA, CVD SYSTEM, AND METHOD FOR DETECTING ITS MALFUNCTION |
摘要 |
PROBLEM TO BE SOLVED: To detect the malfunction of a susceptor before it occurs, to prevent the occurrence of defective articles, and to improve yield. SOLUTION: A plasma CVD system 1, where plasma is generated between a couple of parallel plate RF electrodes disposed in a chamber 2 to deposit a film on the surface of a wafer placed on one of the RF electrode, is provided. This plasma CVD system 1 is provided with the following: an RF generator 3 for supplying high frequency voltage to the RF electrodes; an RF matching box 4 disposed between the RF generator 3 and the RF electrodes; a DC bias detecting means for detecting DC bias signals from the RF matching box 4; and a judging means 5a for judging the presence of arcing in the chamber 2 on the basis of the detected DC bias signals.
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申请公布号 |
JP2001262355(A) |
申请公布日期 |
2001.09.26 |
申请号 |
JP20000073391 |
申请日期 |
2000.03.16 |
申请人 |
APPLIED MATERIALS INC |
发明人 |
NOHIRA MASAYOSHI;IWATA HIDEYUKI;ICHIKI KOZO |
分类号 |
C23C16/52;(IPC1-7):C23C16/52 |
主分类号 |
C23C16/52 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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