发明名称 MANUFACTURING METHOD OF NEAR-FIELD LIGHT GENERATION ELEMENT
摘要 PROBLEM TO BE SOLVED: To provide a manufacturing method for providing a near-field light generation element capable of heightening light utilization efficiency, facilitating extremely highly accurate alignment between a beam supplied to the near-field light generation element and a minute opening or omitting the necessity of the alignment, and being manufactured in mass production at low cost, in an optical memory device, an observation device or the like using near-field light. SOLUTION: This manufacturing method of the near-field light generation element comprises a light guiding structure manufacturing process 101, a projecting shape manufacturing beam irradiation process 102 for irradiating a projecting shape manufacturing beam from a different face from the face where a projecting shape is to be manufactured, a projecting shape manufacturing process 201, and a minute opening manufacturing process 105.
申请公布号 JP2001255253(A) 申请公布日期 2001.09.21
申请号 JP20000062407 申请日期 2000.03.07
申请人 SEIKO INSTRUMENTS INC 发明人 KASAMA NOBUYUKI;OMI MANABU;MITSUOKA YASUYUKI;MAEDA HIDETAKA;KATO KENJI;ARAWA TAKASHI
分类号 G01Q60/22;G01Q80/00;G02B21/00;G11B7/135;G11B7/22 主分类号 G01Q60/22
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