DEVICE FOR CHARGED PARTICLE BEAN EXPOSURE AND METHOD FOR CHARGED PARTICLE BEAM EXPOSURE

摘要

PROBLEM TO BE SOLVED: To provide a device for charged particle beam exposure and a method for exposure by which lithography accuracy and throughput can be improved by improving the arrangement of opening on a mask and the order of exposure. SOLUTION: A character frequency calculation part divides a circuit pattern to be exposed in a plurality of small areas, and calculates the frequency appearance of a character pattern constituting the details of the circuit pattern for every small area. A part for determining the arrangement of character opening calculates a frequency when optional two character patterns are combined in the same small area throughout the circuit pattern, and determines the arrangement of character opening on a mask so that openings of character pattern having a high combination frequency may be mutually close to each other. A deflection order setting part determines an order for using a character opening for every small area so that a distance between the character openings on a mask to be used may become shortest.