| 摘要 |
PROBLEM TO BE SOLVED: To secure dassification performance for high fault by permitting instruction data for fault classification which is set at every fault attribute to follow the fluctuation of a manufacturing process. SOLUTION: Featured values are calculated from fault detected from a semi- conductor wafer and assigned in a featured values space, categories are assigned from a distribution in the space as shown in a figure 10(a) and instruction data for fault classification is generated. When fault detected from the wafer is classified into the respective fault attributes, the instruction data is used. When fault is classified, the same processing is performed concerning the fault to be classified, which is detected from the wafer, classification dealing data shown in a figure 10(b) is generated and, then, it is compared with instruction data shown in the figure 10(a). A difference occurs in these kinds of data when a fluctuation exists in the semi-conductor manufacturing process and obtained instruction data is corrected in accordance with the difference when the difference exists. |
