发明名称 APPARATUS FOR TREATING SUBSTRATES USING SUPERCRITICAL FLUIDS, SUBSTRATE TREATMENT SYSTEM INCLUDING THE SAME AND METHOD OF TREATING SUBSTRATES USING THE SAME
摘要 Disclosed are an apparatus for treating a substrate and a method of treating substrates. The apparatus includes an inlet valve through which the supercritical fluid flows into the process chamber until an inner pressure of the process chamber reaches a first pressure and a turbulent flow generator turbulently supplementing the supercritical fluid into the process chamber until the inner pressure of the process chamber is recovered to the first pressure. A pressure drop module partially removes a supercritical mixture from the process chamber until the inner pressure of the process chamber is dropped to the second pressure. A pressure drop mode and a supplemental mode may be alternately repeated by the flow controller.
申请公布号 US2017008040(A1) 申请公布日期 2017.01.12
申请号 US201615069994 申请日期 2016.03.15
申请人 JEONG Ji-Hoon;OH Jung-Min;LEE Kun-Tack;LEE Hyo-San 发明人 JEONG Ji-Hoon;OH Jung-Min;LEE Kun-Tack;LEE Hyo-San
分类号 B08B7/00;H01L21/02;H01L21/67 主分类号 B08B7/00
代理机构 代理人
主权项 1. An apparatus for treating substrates, the apparatus comprising: a process chamber to treat the substrates using a supercritical fluid; a supply module to supply the supercritical fluid into the process chamber, the supply module having an inlet valve through which the supercritical fluid flows into the process chamber until an inner pressure of the process chamber reaches a first pressure and a turbulent flow generator to turbulently supplement the supercritical fluid into the process chamber until the inner pressure of the process chamber is recovered to the first pressure; a pressure drop module to drop the inner pressure of the process chamber to a second pressure below the first pressure by partially removing a supercritical mixture of the supercritical fluid and chemicals that separated from the substrate from the process chamber until the inner pressure of the process chamber is dropped to the second pressure from the first pressure; and a flow controller alternately repeating a pressure drop mode and a supplemental mode, the supercritical mixture partially flowing out from the process chamber when the inner pressure reaches the first pressure by the pressure drop module in the pressure drop mode, and the supercritical fluid turbulently flowing into the process chamber by the turbulent flow generator when the inner pressure reaches the second pressure in the supplemental mode.
地址 Suwon-si KR