发明名称 Magnetoresistive (MR) sensor element with enhanced resistivity sensitivity and enhanced magnetic exchange bias
摘要 A method for forming a magnetoresistive (MR) sensor element, and a magnetoresistive sensor element fabricated in accord with the method. There is first provided a substrate. There is then formed over the substrate a magnetoresistive (MR) layer comprising: (1) a bulk layer of the magnetoresistive (MR) layer formed of a first magnetoresistive (MR) material optimized to provide an enhanced magnetoresistive (MR) resistivity sensitivity of the magnetoresistive (MR) layer; and (2) a surface layer of the magnetoresistive (MR) layer formed of a second magnetoresistive (MR) material optimized to provide an enhanced magnetic exchange bias when forming a magnetic exchange bias layer upon the surface layer of the magnetoresistive (MR) layer. Finally, there is then formed upon the surface layer of the magnetoresistive (MR) layer the magnetic exchange bias layer. The method contemplates an magnetoresistive (MR) sensor element fabricated in accord with the method. The method is particularly useful for forming a dual stripe magnetoresistive (DSMR) sensor element by employing a single magnetic exchange bias material with separate blocking temperatures.
申请公布号 US6291087(B1) 申请公布日期 2001.09.18
申请号 US19990336786 申请日期 1999.06.21
申请人 HEADWAY TECHNOLOGIES, INC. 发明人 XIAO RONGFU;TORNG CHYU-JIUH;JU KOCHAN;HORNG CHENG;CHANG JEI-WEI
分类号 G11B5/31;G11B5/39;G11B5/66;(IPC1-7):G11B5/66 主分类号 G11B5/31
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