PROCESS FOR FORMING A MICROCRYSTALLINE SILICON SERIES THIN FILM AND APPARATUS SUITABLE FOR PRACTICING SAID PROCESS

摘要

A process for forming a microcrystalline silicon series thin film by arranging a long substrate in a vacuum chamber so as to oppose an electrode provided in said vacuum chamber and while transporting said long substrate in a longitudinal direction, causing glow discharge between said electrode and said long substrate to deposit said microcrystalline silicon series thin film on said long substrate, wherein a plurality of bar-like shaped electrodes as said electrode are arranged such that they are perpendicular to a normal line of said long substrate and their intervals to said long substrate are all or partially differed, and said glow discharge is caused using a high frequency power with an oscillation frequency in a range of from 50 MHz to 550 MHz, whereby depositing said microcrystalline series thin film on said long substrate. An apparatus suitable for practicing said process.