| 摘要 |
PROBLEM TO BE SOLVED: To provide heat treatment equipment which is capable of thermally and uniformly treating a substrate with a lid kept nearly uniform in temperature distribution. SOLUTION: A heat treatment equipment which heat-treats a substrate W at a prescribed temperature is equipped with a heating plate 51 where the substrate W is mounted or provided proximate, a lid 62 which covers the surface of the heating plate 51 to form a processing chamber S during the heat treatment of the substrate W, and a heat pipe 65 which is formed by filling the inner space 62c of the lid 62 with hydraulic fluid 66.
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