| 发明名称 |
POSITIVE PHOTOSENSITIVE RESIN PRECURSOR COMPOSITION |
| 摘要 |
PROBLEM TO BE SOLVED: To provide an alkali developable positive photosensitive resin precursor composition. SOLUTION: The positive photosensitive resin precursor composition contains (a) a polymer based on structural units of formula I and/or formula II, (b) a compound having a phenolic hydroxyl group and (c) an esterified quinonediazido compound. |
| 申请公布号 |
JP2001235860(A) |
申请公布日期 |
2001.08.31 |
| 申请号 |
JP20000182706 |
申请日期 |
2000.06.19 |
| 申请人 |
TORAY IND INC |
发明人 |
SUWA MITSUFUMI;FUJITA YOJI;TOMIKAWA MASAO |
| 分类号 |
G03F7/037;C08G73/14;C08K5/13;C08K5/28;C08L79/08;G03F7/004;G03F7/022;H01L21/027;H01L21/312 |
主分类号 |
G03F7/037 |
| 代理机构 |
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