| 摘要 |
A projection exposure apparatus includes an illumination optical system for illuminating an original with light from a light source and a projection optical system for projecting a pattern of the original, illuminated with the light, onto a substrate to be exposed. The illumination optical system includes an optical integrator having a plurality of lenses, and a movable transparent substrate disposed juxtaposed to a light entrance surface of the optical integrator and being movable in a direction intersecting an optical axis. The transparent substrate has a light quantity adjusting film formed thereon for blocking a portion of light directed to at least one lens of the plurality of lenses to thereby change a light quantity distribution on the at least one lens so as to change an illuminance distribution on a plane to be illuminated.
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