| 摘要 |
PROBLEM TO BE SOLVED: To provide a ceramic substrate for semiconductor reproducing/ inspecting apparatus suitable as a hot plate, an electrostatic chuck, a wafer probe or a susceptor in which the volume resistivity of 108 Ω.cm or above can be ensured under high temperature while guaranteeing concealability, a high radiation heat quantity and measurement accuracy through a thermoviewer. SOLUTION: In the ceramic substrate for semiconductor producing/inspecting apparatus, conductors are arranged on a ceramic substrate containing carbon by such a quantity as a peak can not be detected on an X-ray diffraction chart or lower than a detection limit. |
