SURFACE-TREATING DEVICE

摘要

PROBLEM TO BE SOLVED: To provide a surface-treating device by which high quality surface treatment is performed at a high speed and. SOLUTION: The casing 2 of a surface-treating device 1 is divided into a plasma generating compartment 3 provided with plasma generating electrodes 5 and 6 and a substrate-treating compartment 4 furnished with a substrate holder 9. A plasma blowing port 7 is formed in the anode 6 constituting a partition wall between both compartments 3 and 4. A recess 5a is formed in the upper cathode 5. The blowing port 7 is used as a hollow-anode discharge generating region and the recess 5a as a hollow-cathode discharge generating region.