发明名称 VERTICAL HEAT TREATMENT DEVICE
摘要 PROBLEM TO BE SOLVED: To eliminate an influence of disturbed air flow due to a heat produced in a reaction furnace within a processing chamber and to prevent in advance an adhesion of dust to the surface of a wafer. SOLUTION: A boat 30 is transferred by a boat transfer means 20, between a first waiting position 34 to allow a processed boat 30 to wait and a second waiting position 36 to allow another boat 30 for the next processing to wait. The first and second waiting positions 34 and 36 are located on the upstream side of a clean air from an HEPA filter, and the transfer means 20 is arranged on the downstream side thereof.
申请公布号 JP2001223253(A) 申请公布日期 2001.08.17
申请号 JP20000388359 申请日期 2000.12.21
申请人 TOKYO ELECTRON LTD 发明人 OSAWA SATORU
分类号 B65G49/00;H01L21/205;H01L21/22;H01L21/324;H01L21/677;H01L21/68;(IPC1-7):H01L21/68 主分类号 B65G49/00
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