发明名称 |
PHOTOSENSITIVE RESIN COMPOSITION FOR FORMING PATTERN, AND COLOR FILTER |
摘要 |
PROBLEM TO BE SOLVED: To provide a photosensitive resin composition which causes very small heat shrinkage in heating after patternwise exposure and development and can accurately form a pattern, and a color filter which has columnar projections for setting the thickness of a liquid crystal layer and enables the production of a color liquid crystal display excellent in display quality. SOLUTION: The photosensitive resin composition for forming a pattern consists essentially of a monomer, a polymerization initiator and a resin binder whose weight average molecular weight is in the range of 20,000-70,000. The color filter has a colored layer comprising plural colors formed on a substrate in a prescribed pattern and transparent columnar projections formed in plural prescribed parts on the substrate. The columnar projections are formed by applying the photosensitive resin composition in such a way that it covers the colored layers and carrying out exposure through a photomask having prescribed openings, development and heating. |
申请公布号 |
JP2001222107(A) |
申请公布日期 |
2001.08.17 |
申请号 |
JP20000033027 |
申请日期 |
2000.02.10 |
申请人 |
DAINIPPON PRINTING CO LTD |
发明人 |
MORIYA NORIHISA;SUMINO TOMONOBU |
分类号 |
G03F7/032;G02B5/20;G02F1/1335;G03F7/40 |
主分类号 |
G03F7/032 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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