发明名称 PHOTOSENSITIVE RESIN COMPOSITION FOR FORMING PATTERN, AND COLOR FILTER
摘要 PROBLEM TO BE SOLVED: To provide a photosensitive resin composition which causes very small heat shrinkage in heating after patternwise exposure and development and can accurately form a pattern, and a color filter which has columnar projections for setting the thickness of a liquid crystal layer and enables the production of a color liquid crystal display excellent in display quality. SOLUTION: The photosensitive resin composition for forming a pattern consists essentially of a monomer, a polymerization initiator and a resin binder whose weight average molecular weight is in the range of 20,000-70,000. The color filter has a colored layer comprising plural colors formed on a substrate in a prescribed pattern and transparent columnar projections formed in plural prescribed parts on the substrate. The columnar projections are formed by applying the photosensitive resin composition in such a way that it covers the colored layers and carrying out exposure through a photomask having prescribed openings, development and heating.
申请公布号 JP2001222107(A) 申请公布日期 2001.08.17
申请号 JP20000033027 申请日期 2000.02.10
申请人 DAINIPPON PRINTING CO LTD 发明人 MORIYA NORIHISA;SUMINO TOMONOBU
分类号 G03F7/032;G02B5/20;G02F1/1335;G03F7/40 主分类号 G03F7/032
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